Superparamagnetic and ferromagnetic CoPt nanoparticles deposited on silicon dioxide
نویسندگان
چکیده
منابع مشابه
Energy-Filtered Transmission Electron Microscope Tomography of Silicon Nanoparticles in Silicon Dioxide Deposited with High Density Plasma Chemical Vapor Deposition
High Density Plasma Chemical Vapor Deposition (HDPCVD), a variant of Plasma-Enhanced Chemical Vapor Deposition (PECVD), has demonstrated the capability of growing SiO2 layers with novel electronic properties. In particular, the structure of Si nanoparticles (NPs), in Si-rich HDPCVD SiO2 layers has been correlated with the performance of metal oxide semiconductor (MOS) memory devices [1]. There ...
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ژورنال
عنوان ژورنال: Journal of Physics: Conference Series
سال: 2005
ISSN: 1742-6588,1742-6596
DOI: 10.1088/1742-6596/10/1/038